The EUV FALCON Photoresist Flood Exposure System is designed to quickly expose a wafer with Extreme Ultraviolet (EUV) light, or an electron beam, to determine resist characteristics.

• Designed for simplicity of use and installation

• Includes integrated RGA for outgassing analysis in UHV environments

• Performs simultaneous witness sample exposure via EUV or electron beam

• EUV Tech’s FALCON tool is used for outgassing and contrast curve measurements at IMEC, Sematech, and others

• Configurable for multiple wafer sizes up to 300-mm